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High Purity Zirconium Sputtering Target for Thin Film Deposition

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High Purity Zirconium Sputtering Target for Thin Film Deposition
High Purity Zirconium Sputtering Target for Thin Film Deposition
High Purity Zirconium Sputtering Target for Thin Film Deposition
High Purity Zirconium Sputtering Target for Thin Film Deposition
High Purity Zirconium Sputtering Target for Thin Film Deposition
High Purity Zirconium Sputtering Target for Thin Film Deposition

Key attributes

Industry-specific attributes

Application
Industry

Other attributes

Place of Origin
Henan, China
Brand Name
Zirconium target
Model Number
Zirconium target
Shape
Wire, pipe, bar, discs, target
Material
Zirconium
Chemical Composition
99.95% Zirconium
Product name
Zirconium target
Selling Units
Single item
Packing
as your request
Supply Ability
10000 Piece/Pieces per Month
Brand Name
ZhenAn

Lead time

Product descriptions from the supplier

5 - 49 kilograms
$90.00
>= 50 kilograms
$70.00

Quantity

Shipping

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Item subtotal (0 variations 0 items)
$0.00
Shipping total
$0.00
Subtotal
$0.00

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