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Vacuume Atmosphere Muffle Furnace for Laboratory Inlet Oxygen Nitrogen Argon for Semiconductor Production Heating Treatment

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Vacuume Atmosphere Muffle Furnace for Laboratory Inlet Oxygen Nitrogen Argon  for Semiconductor Production Heating Treatment
Vacuume Atmosphere Muffle Furnace for Laboratory Inlet Oxygen Nitrogen Argon  for Semiconductor Production Heating Treatment
Vacuume Atmosphere Muffle Furnace for Laboratory Inlet Oxygen Nitrogen Argon  for Semiconductor Production Heating Treatment
Vacuume Atmosphere Muffle Furnace for Laboratory Inlet Oxygen Nitrogen Argon  for Semiconductor Production Heating Treatment
Vacuume Atmosphere Muffle Furnace for Laboratory Inlet Oxygen Nitrogen Argon  for Semiconductor Production Heating Treatment
Vacuume Atmosphere Muffle Furnace for Laboratory Inlet Oxygen Nitrogen Argon  for Semiconductor Production Heating Treatment

Key attributes

Other attributes

place of origin
Henan, China
warranty
1 years
customized support
OEM, ODM, OBM
brand name
Diming
model number
DM-12NT
size
Heating Zone 40x300mm
material
Vacuume atmosphere muffle furnace
weight
100kg
Working temperature
1200C
Power
3KW
Thermocouple
K type

Lead time

Customization

Product descriptions from the supplier

>= 5 pieces
$10,000.00

Variations

Total options:1 color.
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color(1)

White

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